Evania - Prêtresse ardente
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Commande bot discord :
!monster Evania
Evania
LEVEL 1
Evolution de
| HP |
3131 |
| ATK |
449 |
| DEF |
240 |
 SPD |
80 |
 CRIT % |
20 % |
 CRIT DMG |
150 % |
 ACC |
20 % |
 RES |
20 % |
| Rang / Level | HP |
ATK |
DEF |
|---|---|---|---|
| 3 | LVL 25 |
5318 | 795 | 421 |
| 4 | LVL 30 |
6350 | 948 | 501 |
| 5 | LVL 35 |
7243 | 1080 | 570 |
Glyphes conseillés au niveau 35
%
Flat
%
1. Rayon lumineux
Cible unique - 1 * ATK
Attaque un ennemi. 65 % de chances de le frapper de confusion pendant 1 tour.
Amélioration de talent
- 1. Dommages +5%
- 2. Dommages +5%
- 3. Dommages +5%
- 4. Dommages +10%
Nombre de monstres avec ce sort parmi nos inscrits : 87
1. Rai de Lumière
Cible unique - 1 * ATK
Attaque un ennemi. 50 % de chances de le réduire au silence (capacités spéciales inutilisables) pendant 1 tour.
Amélioration de talent
- 1. Dommages +5%
- 2. Dommages +5%
- 3. Dommages +5%
- 4. Dommages +10%
Nombre de monstres avec ce sort parmi nos inscrits : 84
2. Lumière d'Astreinte
Cible unique - 1.5 * ATK
Inflige d'importants dommages à un ennemi, réduit de 50 % sa barre de tour et réduit son attaque pendant 3 tours.
Réutilisable dans 4 tour(s)
Amélioration de talent
- 1. Dommages +5%
- 2. Réduction de la barre de tour +5%
- 3. Réduction de la barre de tour +5%
- 4. Dommages +10%
- 5. Réduction de la barre de tour +10%
- 6. Durée de recharge -1
3. Clémence d'Elrath
Un allier
Ressuscite un allié avec 100 % de PV, remplit de 75 % sa barre de tour et augmente sa défense pendant 3 tours.
Réutilisable dans 7 tour(s)
Amélioration de talent
- 1. Augm. de la barre de tour +5%
- 2. Augm. de la barre de tour +5%
- 3. Augm. de la barre de tour +5%
- 4. Augm. de la barre de tour +10%
- 5. Durée de recharge -1
- 6. Durée de recharge -1
10 % de chances d'appliquer Immunité à tous les alliés du Havre pendant 1 tour(s) et d'inverser les dommages pendant 1 tour(s) à chaque fois qu'un allié de l'Inferno ou de la Nécropole meurt.
Amélioration héroïque
- 2. Probabilité d'effet +10%
- 3. Probabilité d'effet +20%
- 4. Durée du 1er effet (tours) +1
- 5. Durée du 2e effet (tours) +1
Parmi les nombreux ordres de l'Église d'Elrath, Dieu Dragon de la Lumière, les Sœurs saintes ont voué leur vie à soigner les blessés et plus généralement à apporter la lumière et la chaleur aux nécessiteux. Les Révérendes mères passent pour être bénies d'Elrath et possèdent de vastes pouvoirs curatifs.
Quelques exemples du monstre parmi nos profils publics
Tri des monstres :
Evania
LVL 30
| HP |
23382 (17032) |
| ATK |
1014 (66) |
| DEF |
608 (107) |
| SPD |
155 (75) |
| CRIT % |
33 % (13 %) |
| CRIT DMG |
178 % (28 %) |
| ACC |
48 % (28 %) |
| RES |
31 % (11 %) |
 EHP
|
58493 |
| SPD |
+23 |
| HP |
+120 |
| % CRIT |
+5 % |
| ACC |
+2 % |
| RES |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
38
Support
38
Debuf.
18
| SPD |
+27 |
| HP |
+8 % |
| DEF |
+33 |
| CRIT |
+7 % |
| ACC |
+11 % |
| SPD |
+7 |
Glyph efficiency
Basic
82
Support
73
Debuf.
87
| HP |
+59 % |
| HP |
+305 |
| HP |
+6 % |
| DEF |
+24 |
| ACC |
+4 % |
| RES |
+8 % |
Glyph efficiency
Basic
63
Support
73
Debuf.
41
| HP |
+59 % |
| DEF |
+25 |
| DEF |
+5 % |
| CRIT |
+14 % |
| ACC |
+7 % |
| SPD |
+4 |
Glyph efficiency
Basic
66
Support
52
Debuf.
46
| HP |
+59 % |
| HP |
+539 |
| HP |
+3 % |
| % CRIT |
+4 % |
| CRIT |
+7 % |
| SPD |
+3 |
Glyph efficiency
Basic
57
Support
52
Debuf.
49
| HP |
+59 % |
| ATK |
+7 % |
| % CRIT |
+4 % |
| ACC |
+4 % |
| SPD |
+8 |
Glyph efficiency
Basic
54
Support
40
Debuf.
46
Evania
LVL 30
| HP |
10381 (4031) |
| ATK |
1077 (129) |
| DEF |
985 (484) |
| SPD |
132 (52) |
| CRIT % |
25 % (5 %) |
| CRIT DMG |
150 % |
| ACC |
30 % (10 %) |
| RES |
20 % |
|
EHP
|
39589 |
| SPD |
+18 |
| HP |
+2 % |
| DEF |
+8 |
| ATK |
+43 |
| ACC |
+3 % |
| SPD |
+2 |
Glyph efficiency
Basic
27
Support
30
Debuf.
19
| SPD |
+18 |
| DEF |
+4 % |
| ACC |
+2 % |
| SPD |
+6 |
Glyph efficiency
Basic
27
Support
40
Debuf.
27
| DEF |
+132 |
| HP |
+49 |
| DEF |
+18 |
| DEF |
+2 % |
| SPD |
+2 |
Glyph efficiency
Basic
17
Support
32
Debuf.
16
| DEF |
+132 |
| DEF |
+4 % |
| ATK |
+48 |
| ATK |
+4 % |
| % CRIT |
+2 % |
| ACC |
+2 % |
Glyph efficiency
Basic
36
Support
26
Debuf.
13
| HP |
+28 % |
| HP |
+4 % |
| DEF |
+23 |
| ACC |
+3 % |
| SPD |
+2 |
Glyph efficiency
Basic
28
Support
39
Debuf.
27
| HP |
+28 % |
| HP |
+45 |
| DEF |
+16 |
| DEF |
+1 % |
| % CRIT |
+3 % |
| SPD |
+4 |
Glyph efficiency
Basic
27
Support
34
Debuf.
18
Evania
LVL 35
| HP |
15095 (7852) |
| ATK |
1625 (545) |
| DEF |
1964 (1394) |
| SPD |
91 (11) |
| CRIT % |
26 % (6 %) |
| CRIT DMG |
163 % (13 %) |
| ACC |
62 % (42 %) |
| RES |
27 % (7 %) |
|
EHP
|
129546 |
| DEF |
+58 % |
| HP |
+4 % |
| DEF |
+57 |
| DEF |
+19 % |
| ATK |
+98 |
| ACC |
+11 % |
Glyph efficiency
Basic
112
Support
79
Debuf.
89
| DEF |
+58 % |
| HP |
+4 % |
| DEF |
+61 |
| DEF |
+6 % |
| ATK |
+11 % |
| % CRIT |
+6 % |
Glyph efficiency
Basic
77
Support
55
Debuf.
51
| HP |
+2760 |
| HP |
+4 % |
| DEF |
+68 |
| DEF |
+3 % |
| CRIT |
+13 % |
| ACC |
+4 % |
Glyph efficiency
Basic
65
Support
57
Debuf.
59
| HP |
+43 % |
| HP |
+209 |
| DEF |
+5 % |
| ATK |
+80 |
| ATK |
+5 % |
| ACC |
+7 % |
Glyph efficiency
Basic
63
Support
43
Debuf.
52
| DEF |
+49 % |
| HP |
+319 |
| HP |
+4 % |
| DEF |
+45 |
| DEF |
+3 % |
| ATK |
+160 |
Glyph efficiency
Basic
75
Support
58
Debuf.
54
| ACC |
+20 % |
| HP |
+4 % |
| DEF |
+3 % |
| ATK |
+34 |
| RES |
+7 % |
| SPD |
+11 |
Glyph efficiency
Basic
66
Support
9
Debuf.
55
Evania
LVL 28
| HP |
15492 (8762) |
| ATK |
1332 (328) |
| DEF |
1037 (506) |
| SPD |
148 (68) |
| CRIT % |
32 % (12 %) |
| CRIT DMG |
196 % (46 %) |
| ACC |
35 % (15 %) |
| RES |
33 % (13 %) |
|
EHP
|
62238 |
| SPD |
+24 |
| HP |
+501 |
| HP |
+4 % |
| DEF |
+8 % |
| ATK |
+88 |
| CRIT |
+7 % |
Glyph efficiency
Basic
74
Support
61
Debuf.
56
| SPD |
+24 |
| HP |
+4 % |
| ATK |
+8 % |
| % CRIT |
+4 % |
| CRIT |
+6 % |
| ACC |
+7 % |
Glyph efficiency
Basic
60
Support
32
Debuf.
41
| DEF |
+216 |
| ATK |
+70 |
| CRIT |
+21 % |
| ACC |
+4 % |
| RES |
+3 % |
Glyph efficiency
Basic
62
Support
28
Debuf.
26
| DEF |
+216 |
| HP |
+429 |
| ATK |
+4 % |
| % CRIT |
+4 % |
| CRIT |
+12 % |
| RES |
+3 % |
Glyph efficiency
Basic
62
Support
41
Debuf.
32
| HP |
+43 % |
| HP |
+217 |
| HP |
+9 % |
| DEF |
+6 % |
| % CRIT |
+4 % |
Glyph efficiency
Basic
50
Support
55
Debuf.
51
| HP |
+43 % |
| HP |
+212 |
| HP |
+7 % |
| ATK |
+5 % |
| ACC |
+4 % |
| RES |
+7 % |
Glyph efficiency
Basic
61
Support
61
Debuf.
47
Evania
LVL 35
| HP |
10985 (3742) |
| ATK |
2808 (1728) |
| DEF |
1086 (516) |
| SPD |
116 (36) |
| CRIT % |
35 % (15 %) |
| CRIT DMG |
263 % (113 %) |
| ACC |
96 % (76 %) |
| RES |
39 % (19 %) |
|
EHP
|
46297 |
| DEF |
+339 |
| HP |
+6 % |
| % CRIT |
+5 % |
| CRIT |
+15 % |
| RES |
+4 % |
| SPD |
+10 |
Glyph efficiency
Basic
81
Dps
3
Support
62
Debuf.
51
| ATK |
+58 % |
| HP |
+436 |
| HP |
+12 % |
| DEF |
+52 |
| DEF |
+6 % |
| RES |
+6 % |
Glyph efficiency
Basic
88
Support
38
Debuf.
15
| ATK |
+778 |
| DEF |
+29 |
| ATK |
+96 |
| ATK |
+5 % |
| ACC |
+6 % |
| SPD |
+14 |
Glyph efficiency
Basic
89
Dps
47
Support
2
Debuf.
10
| CRIT |
+60 % |
| HP |
+254 |
| ATK |
+98 |
| ATK |
+7 % |
| CRIT |
+8 % |
| ACC |
+16 % |
Glyph efficiency
Basic
96
Dps
43
Debuf.
4
| ACC |
+25 % |
| HP |
+227 |
| HP |
+6 % |
| DEF |
+62 |
| % CRIT |
+10 % |
| CRIT |
+15 % |
Glyph efficiency
Basic
89
Dps
4
Debuf.
38
| ACC |
+25 % |
| HP |
+15 % |
| CRIT |
+15 % |
| ACC |
+4 % |
| RES |
+9 % |
Glyph efficiency
Basic
84
Support
8
Debuf.
38
Evania
LVL 30
| HP |
7502 (1152) |
| ATK |
2177 (1229) |
| DEF |
651 (150) |
| SPD |
83 (3) |
| CRIT % |
23 % (3 %) |
| CRIT DMG |
176 % (26 %) |
| ACC |
26 % (6 %) |
| RES |
27 % (7 %) |
|
EHP
|
19779 |
| DEF |
+75 |
| HP |
+5 % |
| ACC |
+3 % |
Glyph efficiency
Basic
18
Support
14
Debuf.
17
| DEF |
+75 |
| HP |
+392 |
| ATK |
+3 % |
| RES |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
41
Support
35
Debuf.
23
| ATK |
+220 |
| CRIT |
+13 % |
| ACC |
+3 % |
Glyph efficiency
Basic
26
Dps
34
| ATK |
+220 |
| ATK |
+4 % |
| CRIT |
+13 % |
| RES |
+3 % |
Glyph efficiency
Basic
34
Dps
44
| ATK |
+3 % |
Glyph efficiency
Basic
1
Dps
15
| ATK |
+220 |
| HP |
+188 |
| HP |
+4 % |
| ATK |
+10 % |
| % CRIT |
+3 % |
Glyph efficiency
Basic
44
Dps
51
Evania
LVL 35
| HP |
12972 (5729) |
| ATK |
1790 (710) |
| DEF |
1050 (480) |
| SPD |
128 (48) |
| CRIT % |
35 % (15 %) |
| CRIT DMG |
255 % (105 %) |
| ACC |
123 % (103 %) |
| RES |
116 % (96 %) |
|
EHP
|
52786 |
| DEF |
+58 % |
| HP |
+11 % |
| ATK |
+54 |
| ATK |
+16 % |
| ACC |
+14 % |
| SPD |
+6 |
Glyph efficiency
Basic
115
Dps
8
Support
55
Debuf.
88
| SPD |
+30 |
| DEF |
+6 % |
| ATK |
+13 % |
| CRIT |
+23 % |
| ACC |
+8 % |
| RES |
+5 % |
Glyph efficiency
Basic
103
Dps
17
Support
50
Debuf.
33
| CRIT |
+60 % |
| DEF |
+25 |
| ATK |
+15 % |
| CRIT |
+14 % |
| ACC |
+15 % |
| RES |
+6 % |
Glyph efficiency
Basic
111
Dps
59
| HP |
+4003 |
| HP |
+490 |
| DEF |
+90 |
| ATK |
+56 |
| % CRIT |
+5 % |
| ACC |
+18 % |
Glyph efficiency
Basic
120
Support
89
Debuf.
96
| RES |
+25 % |
| ATK |
+64 |
| CRIT |
+8 % |
| ACC |
+15 % |
| RES |
+10 % |
| SPD |
+4 |
Glyph efficiency
Basic
97
Support
54
Debuf.
1
| RES |
+25 % |
| HP |
+439 |
| ATK |
+61 |
| % CRIT |
+10 % |
| ACC |
+8 % |
| SPD |
+8 |
Glyph efficiency
Basic
96
Dps
3
Support
49
Debuf.
9
Evania
LVL 35
| HP |
16803 (9560) |
| ATK |
1541 (461) |
| DEF |
1032 (462) |
| SPD |
142 (62) |
| CRIT % |
34 % (14 %) |
| CRIT DMG |
194 % (44 %) |
| ACC |
25 % (5 %) |
| RES |
33 % (13 %) |
|
EHP
|
67171 |
| SPD |
+23 |
| HP |
+3 % |
| DEF |
+24 |
| ATK |
+19 |
| % CRIT |
+9 % |
| ACC |
+2 % |
Glyph efficiency
Basic
45
Support
32
Debuf.
18
| SPD |
+27 |
| HP |
+6 % |
| ATK |
+36 |
| ATK |
+15 % |
| CRIT |
+6 % |
| RES |
+3 % |
Glyph efficiency
Basic
65
Support
35
Debuf.
11
| DEF |
+169 |
| DEF |
+41 |
| DEF |
+3 % |
| % CRIT |
+5 % |
| CRIT |
+5 % |
Glyph efficiency
Basic
39
Support
35
Debuf.
18
| DEF |
+169 |
| DEF |
+25 |
| ATK |
+21 |
| ATK |
+4 % |
| RES |
+2 % |
| SPD |
+2 |
Glyph efficiency
Basic
31
Support
33
Debuf.
12
| HP |
+59 % |
| DEF |
+3 % |
| ATK |
+40 |
| CRIT |
+6 % |
| RES |
+8 % |
| SPD |
+7 |
Glyph efficiency
Basic
60
Support
59
Debuf.
23
| HP |
+59 % |
| HP |
+5 % |
| ATK |
+13 % |
| CRIT |
+27 % |
| ACC |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
90
Dps
27
Support
36
Debuf.
25
Evania
LVL 30
| HP |
12190 (5840) |
| ATK |
1250 (302) |
| DEF |
1110 (609) |
| SPD |
131 (51) |
| CRIT % |
24 % (4 %) |
| CRIT DMG |
167 % (17 %) |
| ACC |
40 % (20 %) |
| RES |
22 % (2 %) |
|
EHP
|
52575 |
| DEF |
+169 |
| HP |
+2 % |
| DEF |
+16 |
| ATK |
+99 |
| ACC |
+3 % |
| SPD |
+5 |
Glyph efficiency
Basic
49
Support
41
Debuf.
44
| SPD |
+27 |
| HP |
+296 |
| HP |
+4 % |
| ATK |
+39 |
| CRIT |
+13 % |
| ACC |
+6 % |
Glyph efficiency
Basic
62
Support
44
Debuf.
35
| HP |
+36 % |
| HP |
+82 |
| DEF |
+30 |
| DEF |
+6 % |
| ATK |
+6 % |
| ACC |
+5 % |
Glyph efficiency
Basic
50
Support
47
Debuf.
37
| HP |
+36 % |
| DEF |
+6 % |
| ATK |
+27 |
| ATK |
+5 % |
| % CRIT |
+2 % |
| ACC |
+6 % |
Glyph efficiency
Basic
47
Support
35
Debuf.
42
| DEF |
+30 % |
| HP |
+5 % |
| DEF |
+19 |
| ATK |
+33 |
| RES |
+2 % |
| SPD |
+3 |
Glyph efficiency
Basic
35
Support
44
Debuf.
37
| DEF |
+30 % |
| HP |
+3 % |
| DEF |
+3 % |
| % CRIT |
+2 % |
| CRIT |
+4 % |
| SPD |
+6 |
Glyph efficiency
Basic
38
Support
42
Debuf.
26
Evania
LVL 35
| HP |
24932 (17639) |
| ATK |
1537 (457) |
| DEF |
1345 (775) |
| SPD |
120 (40) |
| CRIT % |
34 % (14 %) |
| CRIT DMG |
150 % |
| ACC |
28 % (8 %) |
| RES |
35 % (15 %) |
|
EHP
|
133099 |
| DEF |
+265 |
| HP |
+322 |
| DEF |
+47 |
| ATK |
+4 % |
| % CRIT |
+7 % |
| SPD |
+3 |
Glyph efficiency
Basic
63
Support
52
Debuf.
49
| DEF |
+265 |
| HP |
+125 |
| HP |
+4 % |
| DEF |
+5 % |
| ATK |
+177 |
| SPD |
+7 |
Glyph efficiency
Basic
76
Support
56
Debuf.
39
| HP |
+3731 |
| HP |
+223 |
| HP |
+4 % |
| DEF |
+31 |
| ATK |
+5 % |
| % CRIT |
+7 % |
Glyph efficiency
Basic
56
Support
43
Debuf.
25
| HP |
+59 % |
| DEF |
+71 |
| ATK |
+71 |
| ACC |
+4 % |
| RES |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
65
Support
61
Debuf.
40
| HP |
+59 % |
| HP |
+182 |
| DEF |
+44 |
| ACC |
+4 % |
| RES |
+11 % |
| SPD |
+3 |
Glyph efficiency
Basic
68
Support
78
Debuf.
54
| HP |
+3577 |
| HP |
+289 |
| DEF |
+4 % |
| ATK |
+112 |
| SPD |
+14 |
Glyph efficiency
Basic
78
Support
71
Debuf.
69
Evania
LVL 35
| HP |
22711 (15468) |
| ATK |
1287 (207) |
| DEF |
1039 (469) |
| SPD |
148 (68) |
| CRIT % |
31 % (11 %) |
| CRIT DMG |
171 % (21 %) |
| ACC |
31 % (11 %) |
| RES |
36 % (16 %) |
|
EHP
|
91420 |
| SPD |
+27 |
| HP |
+158 |
| HP |
+5 % |
| DEF |
+3 % |
| ATK |
+70 |
| CRIT |
+13 % |
Glyph efficiency
Basic
56
Support
38
Debuf.
36
| SPD |
+27 |
| HP |
+585 |
| DEF |
+46 |
| ATK |
+43 |
| SPD |
+4 |
Glyph efficiency
Basic
60
Support
66
Debuf.
62
| DEF |
+265 |
| HP |
+183 |
| HP |
+4 % |
| DEF |
+34 |
| % CRIT |
+7 % |
| RES |
+6 % |
Glyph efficiency
Basic
60
Support
57
Debuf.
40
| HP |
+4003 |
| HP |
+4 % |
| ATK |
+6 % |
| % CRIT |
+4 % |
| CRIT |
+8 % |
| ACC |
+4 % |
Glyph efficiency
Basic
51
Support
28
Debuf.
18
| HP |
+59 % |
| DEF |
+22 |
| DEF |
+5 % |
| ATK |
+29 |
| ACC |
+7 % |
| RES |
+7 % |
Glyph efficiency
Basic
58
Support
59
Debuf.
35
| HP |
+59 % |
| HP |
+399 |
| HP |
+9 % |
| DEF |
+27 |
| DEF |
+5 % |
| RES |
+3 % |
Glyph efficiency
Basic
62
Support
77
Debuf.
49
Evania
LVL 35
| HP |
23700 (16457) |
| ATK |
1339 (259) |
| DEF |
1290 (720) |
| SPD |
135 (55) |
| CRIT % |
45 % (25 %) |
| CRIT DMG |
169 % (19 %) |
| ACC |
34 % (14 %) |
| RES |
24 % (4 %) |
|
EHP
|
120593 |
| DEF |
+265 |
| HP |
+5 % |
| DEF |
+18 |
| % CRIT |
+11 % |
| RES |
+4 % |
| SPD |
+6 |
Glyph efficiency
Basic
69
Support
56
Debuf.
29
| SPD |
+27 |
| HP |
+641 |
| HP |
+7 % |
| ATK |
+7 % |
| % CRIT |
+4 % |
| CRIT |
+7 % |
Glyph efficiency
Basic
76
Support
57
Debuf.
38
| HP |
+59 % |
| HP |
+334 |
| HP |
+3 % |
| CRIT |
+12 % |
| ACC |
+3 % |
| SPD |
+9 |
Glyph efficiency
Basic
68
Support
62
Debuf.
49
| HP |
+59 % |
| HP |
+346 |
| HP |
+8 % |
| DEF |
+42 |
| ATK |
+9 % |
| SPD |
+7 |
Glyph efficiency
Basic
81
Support
78
Debuf.
58
| DEF |
+49 % |
| HP |
+9 % |
| DEF |
+76 |
| DEF |
+4 % |
| % CRIT |
+3 % |
| ACC |
+3 % |
Glyph efficiency
Basic
66
Support
70
Debuf.
54
| HP |
+59 % |
| DEF |
+3 % |
| ATK |
+8 % |
| % CRIT |
+7 % |
| ACC |
+8 % |
| SPD |
+6 |
Glyph efficiency
Basic
75
Dps
3
Support
46
Debuf.
42
Evania
LVL 30
| HP |
21191 (14841) |
| ATK |
1129 (181) |
| DEF |
1227 (726) |
| SPD |
114 (34) |
| CRIT % |
44 % (24 %) |
| CRIT DMG |
163 % (13 %) |
| ACC |
55 % (35 %) |
| RES |
42 % (22 %) |
|
EHP
|
101915 |
| DEF |
+339 |
| HP |
+15 % |
| DEF |
+28 |
| % CRIT |
+17 % |
| ACC |
+5 % |
| RES |
+4 % |
Glyph efficiency
Basic
104
Dps
5
Support
56
Debuf.
49
| SPD |
+27 |
| HP |
+429 |
| HP |
+11 % |
| DEF |
+3 % |
| CRIT |
+7 % |
| ACC |
+7 % |
Glyph efficiency
Basic
74
Support
56
Debuf.
61
| DEF |
+265 |
| HP |
+312 |
| % CRIT |
+7 % |
| ACC |
+11 % |
| RES |
+8 % |
| SPD |
+4 |
Glyph efficiency
Basic
89
Support
72
Debuf.
68
| HP |
+59 % |
| HP |
+6 % |
| CRIT |
+6 % |
| ACC |
+3 % |
| RES |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
46
Support
48
Debuf.
27
| HP |
+59 % |
| HP |
+4 % |
| DEF |
+19 |
| DEF |
+8 % |
| ATK |
+9 % |
| ACC |
+6 % |
Glyph efficiency
Basic
63
Support
38
Debuf.
44
| HP |
+59 % |
| HP |
+9 % |
| DEF |
+4 % |
| ATK |
+96 |
| ACC |
+3 % |
| RES |
+6 % |
Glyph efficiency
Basic
68
Support
60
Debuf.
32
Evania
LVL 30
| HP |
18026 (11676) |
| ATK |
1155 (207) |
| DEF |
873 (372) |
| SPD |
174 (94) |
| CRIT % |
46 % (26 %) |
| CRIT DMG |
164 % (14 %) |
| ACC |
29 % (9 %) |
| RES |
24 % (4 %) |
|
EHP
|
61169 |
| SPD |
+21 |
| HP |
+5 % |
| DEF |
+3 % |
| ATK |
+29 |
| % CRIT |
+4 % |
| SPD |
+7 |
Glyph efficiency
Basic
49
Support
34
Debuf.
32
| SPD |
+24 |
| HP |
+164 |
| ATK |
+5 % |
| CRIT |
+14 % |
| ACC |
+3 % |
| SPD |
+7 |
Glyph efficiency
Basic
62
Support
43
Debuf.
32
| DEF |
+220 |
| HP |
+6 % |
| % CRIT |
+11 % |
| RES |
+4 % |
| SPD |
+9 |
Glyph efficiency
Basic
72
Support
45
Debuf.
33
| HP |
+69 % |
| DEF |
+60 |
| ATK |
+103 |
| % CRIT |
+11 % |
| ACC |
+6 % |
| SPD |
+10 |
Glyph efficiency
Basic
108
Dps
15
Support
53
Debuf.
60
| HP |
+3577 |
| HP |
+541 |
| HP |
+4 % |
| DEF |
+21 |
| ATK |
+3 % |
| SPD |
+8 |
Glyph efficiency
Basic
65
Support
59
Debuf.
70
| HP |
+2059 |
| DEF |
+16 |
| DEF |
+8 % |
| SPD |
+8 |
Glyph efficiency
Basic
41
Support
56
Debuf.
39
Evania
LVL 35
| HP |
17252 (10009) |
| ATK |
1975 (895) |
| DEF |
1036 (466) |
| SPD |
127 (47) |
| CRIT % |
24 % (4 %) |
| CRIT DMG |
157 % (7 %) |
| ACC |
33 % (13 %) |
| RES |
61 % (41 %) |
|
EHP
|
69240 |
| ATK |
+50 % |
| DEF |
+115 |
| ATK |
+46 |
| ATK |
+4 % |
| RES |
+9 % |
| SPD |
+6 |
Glyph efficiency
Basic
93
Dps
26
Support
26
| SPD |
+25 |
| HP |
+307 |
| ATK |
+64 |
| CRIT |
+7 % |
| RES |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
54
Support
46
Debuf.
20
| HP |
+59 % |
| HP |
+694 |
| ATK |
+8 % |
| RES |
+3 % |
| SPD |
+4 |
Glyph efficiency
Basic
64
Support
63
Debuf.
37
| HP |
+45 % |
| HP |
+5 % |
| DEF |
+45 |
| % CRIT |
+4 % |
| ACC |
+6 % |
| SPD |
+3 |
Glyph efficiency
Basic
58
Support
55
Debuf.
47
| RES |
+21 % |
| HP |
+13 % |
| DEF |
+19 |
| ATK |
+4 % |
| ACC |
+7 % |
| RES |
+4 % |
Glyph efficiency
Basic
68
Support
66
| DEF |
+39 % |
| HP |
+172 |
| DEF |
+42 |
| DEF |
+4 % |
| ATK |
+73 |
| SPD |
+6 |
Glyph efficiency
Basic
59
Support
60
Debuf.
42
Evania
LVL 35
| HP |
19567 (12324) |
| ATK |
1437 (357) |
| DEF |
1677 (1107) |
| SPD |
121 (41) |
| CRIT % |
40 % (20 %) |
| CRIT DMG |
169 % (19 %) |
| ACC |
27 % (7 %) |
| RES |
31 % (11 %) |
|
EHP
|
136586 |
| DEF |
+49 % |
| HP |
+246 |
| HP |
+5 % |
| DEF |
+39 |
| ATK |
+4 % |
| % CRIT |
+6 % |
Glyph efficiency
Basic
57
Support
34
Debuf.
30
| SPD |
+27 |
| HP |
+318 |
| HP |
+7 % |
| DEF |
+44 |
| % CRIT |
+4 % |
| SPD |
+10 |
Glyph efficiency
Basic
78
Support
68
Debuf.
63
| HP |
+59 % |
| HP |
+540 |
| DEF |
+4 % |
| % CRIT |
+6 % |
| CRIT |
+13 % |
| RES |
+7 % |
Glyph efficiency
Basic
83
Support
49
Debuf.
29
| HP |
+59 % |
| HP |
+14 % |
| DEF |
+25 |
| ATK |
+12 % |
| RES |
+4 % |
| SPD |
+4 |
Glyph efficiency
Basic
80
Support
56
Debuf.
43
| DEF |
+49 % |
| DEF |
+56 |
| DEF |
+5 % |
| ATK |
+78 |
| CRIT |
+6 % |
| ACC |
+7 % |
Glyph efficiency
Basic
70
Support
37
Debuf.
45
| DEF |
+49 % |
| HP |
+212 |
| HP |
+8 % |
| DEF |
+54 |
| ATK |
+106 |
| % CRIT |
+4 % |
Glyph efficiency
Basic
75
Support
43
Debuf.
39
Evania
LVL 35
| HP |
11293 (4050) |
| ATK |
1571 (491) |
| DEF |
992 (422) |
| SPD |
105 (25) |
| CRIT % |
29 % (9 %) |
| CRIT DMG |
160 % (10 %) |
| ACC |
23 % (3 %) |
| RES |
27 % (7 %) |
|
EHP
|
43373 |
| DEF |
+21 % |
| HP |
+2 % |
| % CRIT |
+2 % |
| CRIT |
+4 % |
| ACC |
+3 % |
Glyph efficiency
Basic
22
Support
23
Debuf.
27
| DEF |
+30 % |
| ATK |
+3 % |
| % CRIT |
+3 % |
| CRIT |
+6 % |
| RES |
+5 % |
Glyph efficiency
Basic
35
Support
28
Debuf.
15
| HP |
+1716 |
| % CRIT |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
18
Support
23
Debuf.
23
| HP |
+25 % |
| HP |
+2 % |
| ATK |
+5 % |
| SPD |
+2 |
Glyph efficiency
Basic
19
Support
24
Debuf.
24
| ATK |
+323 |
| HP |
+136 |
| DEF |
+2 % |
| ATK |
+28 |
Glyph efficiency
Basic
16
Dps
4
| DEF |
+21 % |
| HP |
+97 |
| ATK |
+5 % |
| RES |
+2 % |
Glyph efficiency
Basic
19
Support
24
Debuf.
19
Evania
LVL 35
| HP |
17432 (10189) |
| ATK |
1372 (292) |
| DEF |
1566 (996) |
| SPD |
109 (29) |
| CRIT % |
34 % (14 %) |
| CRIT DMG |
180 % (30 %) |
| ACC |
74 % (54 %) |
| RES |
26 % (6 %) |
|
EHP
|
111675 |
| HP |
+3577 |
| HP |
+487 |
| ATK |
+4 % |
| % CRIT |
+4 % |
| ACC |
+11 % |
| SPD |
+4 |
Glyph efficiency
Basic
77
Support
60
Debuf.
60
| DEF |
+49 % |
| HP |
+388 |
| ATK |
+7 % |
| % CRIT |
+7 % |
| CRIT |
+6 % |
| ACC |
+10 % |
Glyph efficiency
Basic
82
Support
45
Debuf.
43
| HP |
+50 % |
| HP |
+2 % |
| ATK |
+91 |
| % CRIT |
+3 % |
| CRIT |
+10 % |
| RES |
+3 % |
Glyph efficiency
Basic
52
Support
27
Debuf.
4
| DEF |
+265 |
| HP |
+175 |
| HP |
+3 % |
| DEF |
+3 % |
| CRIT |
+14 % |
| SPD |
+15 |
Glyph efficiency
Basic
77
Support
72
Debuf.
55
| DEF |
+49 % |
| HP |
+129 |
| DEF |
+93 |
| ACC |
+3 % |
| RES |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
59
Support
70
Debuf.
49
| ACC |
+23 % |
| DEF |
+11 % |
| ATK |
+39 |
| ATK |
+4 % |
| ACC |
+7 % |
| SPD |
+7 |
Glyph efficiency
Basic
73
Debuf.
57
Evania
LVL 35
| HP |
21849 (14606) |
| ATK |
1455 (375) |
| DEF |
1076 (506) |
| SPD |
131 (51) |
| CRIT % |
48 % (28 %) |
| CRIT DMG |
186 % (36 %) |
| ACC |
46 % (26 %) |
| RES |
46 % (26 %) |
|
EHP
|
91196 |
| HP |
+4003 |
| ATK |
+36 |
| % CRIT |
+5 % |
| CRIT |
+22 % |
| RES |
+4 % |
| SPD |
+21 |
Glyph efficiency
Basic
114
Dps
34
Support
78
Debuf.
53
| DEF |
+265 |
| ATK |
+81 |
| % CRIT |
+7 % |
| CRIT |
+7 % |
| RES |
+7 % |
| SPD |
+7 |
Glyph efficiency
Basic
79
Dps
5
Support
50
Debuf.
33
| HP |
+31 % |
| % CRIT |
+7 % |
| ACC |
+3 % |
| RES |
+7 % |
| SPD |
+7 |
Glyph efficiency
Basic
60
Support
54
Debuf.
41
| HP |
+53 % |
| DEF |
+107 |
| DEF |
+6 % |
| ATK |
+7 % |
| % CRIT |
+5 % |
| SPD |
+6 |
Glyph efficiency
Basic
89
Support
78
Debuf.
58
| HP |
+3577 |
| DEF |
+35 |
| ATK |
+7 % |
| % CRIT |
+4 % |
| CRIT |
+7 % |
| RES |
+8 % |
Glyph efficiency
Basic
66
Support
47
Debuf.
25
| ACC |
+23 % |
| HP |
+13 % |
| DEF |
+48 |
| DEF |
+3 % |
| ATK |
+41 |
| ATK |
+6 % |
Glyph efficiency
Basic
68
Debuf.
43
Evania
LVL 25
| HP |
20899 (15581) |
| ATK |
930 (135) |
| DEF |
635 (214) |
| SPD |
150 (70) |
| CRIT % |
35 % (15 %) |
| CRIT DMG |
201 % (51 %) |
| ACC |
46 % (26 %) |
| RES |
67 % (47 %) |
|
EHP
|
54042 |
| SPD |
+27 |
| HP |
+7 % |
| DEF |
+46 |
| DEF |
+12 % |
| ACC |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
68
Support
80
Debuf.
79
| SPD |
+27 |
| DEF |
+32 |
| DEF |
+4 % |
| % CRIT |
+6 % |
| CRIT |
+14 % |
| RES |
+14 % |
Glyph efficiency
Basic
89
Support
69
Debuf.
17
| HP |
+79 % |
| HP |
+5 % |
| DEF |
+22 |
| ACC |
+8 % |
| RES |
+10 % |
| SPD |
+7 |
Glyph efficiency
Basic
80
Support
85
Debuf.
70
| HP |
+69 % |
| HP |
+11 % |
| ATK |
+11 % |
| % CRIT |
+9 % |
| CRIT |
+15 % |
| RES |
+9 % |
Glyph efficiency
Basic
110
Dps
29
Support
60
Debuf.
20
| HP |
+59 % |
| DEF |
+11 % |
| CRIT |
+7 % |
| ACC |
+9 % |
| RES |
+4 % |
| SPD |
+6 |
Glyph efficiency
Basic
80
Support
73
Debuf.
75
| HP |
+51 % |
| HP |
+12 % |
| ATK |
+6 % |
| CRIT |
+15 % |
| ACC |
+6 % |
| RES |
+10 % |
Glyph efficiency
Basic
97
Support
72
Debuf.
38
Evania
LVL 30
| HP |
14661 (8311) |
| ATK |
1220 (272) |
| DEF |
1277 (776) |
| SPD |
147 (67) |
| CRIT % |
20 % |
| CRIT DMG |
157 % (7 %) |
| ACC |
33 % (13 %) |
| RES |
65 % (45 %) |
|
EHP
|
73746 |
| SPD |
+24 |
| HP |
+126 |
| DEF |
+21 |
| DEF |
+3 % |
| ATK |
+3 % |
| CRIT |
+7 % |
Glyph efficiency
Basic
35
Support
34
Debuf.
32
| SPD |
+24 |
| HP |
+407 |
| DEF |
+8 % |
| ATK |
+44 |
| ACC |
+4 % |
| RES |
+4 % |
Glyph efficiency
Basic
63
Support
64
Debuf.
42
| DEF |
+265 |
| HP |
+3 % |
| DEF |
+4 % |
| ACC |
+9 % |
| RES |
+7 % |
| SPD |
+3 |
Glyph efficiency
Basic
62
Support
65
Debuf.
45
| DEF |
+216 |
| HP |
+3 % |
| DEF |
+6 % |
| ATK |
+4 % |
| RES |
+12 % |
| SPD |
+3 |
Glyph efficiency
Basic
64
Support
71
Debuf.
39
| HP |
+63 % |
| HP |
+346 |
| DEF |
+51 |
| ATK |
+37 |
| ATK |
+9 % |
| RES |
+6 % |
Glyph efficiency
Basic
73
Support
62
Debuf.
29
| HP |
+43 % |
| HP |
+5 % |
| DEF |
+18 |
| ATK |
+40 |
| RES |
+16 % |
| SPD |
+3 |
Glyph efficiency
Basic
72
Support
79
Debuf.
37
Evania
LVL 35
| HP |
17112 (9869) |
| ATK |
1492 (412) |
| DEF |
1062 (492) |
| SPD |
144 (64) |
| CRIT % |
35 % (15 %) |
| CRIT DMG |
191 % (41 %) |
| ACC |
29 % (9 %) |
| RES |
52 % (32 %) |
|
EHP
|
70457 |
| SPD |
+27 |
| HP |
+5 % |
| DEF |
+9 % |
| ATK |
+46 |
| CRIT |
+7 % |
| SPD |
+3 |
Glyph efficiency
Basic
55
Support
51
Debuf.
33
| SPD |
+27 |
| DEF |
+3 % |
| ATK |
+4 % |
| CRIT |
+19 % |
| RES |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
59
Support
39
Debuf.
13
| DEF |
+265 |
| HP |
+3 % |
| DEF |
+46 |
| DEF |
+4 % |
| ATK |
+3 % |
| % CRIT |
+4 % |
Glyph efficiency
Basic
45
Support
44
Debuf.
26
| HP |
+59 % |
| HP |
+194 |
| DEF |
+10 % |
| ATK |
+9 % |
| % CRIT |
+7 % |
| SPD |
+4 |
Glyph efficiency
Basic
74
Dps
2
Support
54
Debuf.
36
| RES |
+25 % |
| HP |
+392 |
| DEF |
+33 |
| ATK |
+10 % |
| CRIT |
+15 % |
| ACC |
+9 % |
Glyph efficiency
Basic
92
Support
54
Debuf.
0
| HP |
+59 % |
| HP |
+158 |
| ATK |
+8 % |
| % CRIT |
+4 % |
| RES |
+3 % |
Glyph efficiency
Basic
40
Support
29
Debuf.
6
Evania
LVL 25
| HP |
10242 (4924) |
| ATK |
911 (116) |
| DEF |
584 (163) |
| SPD |
92 (12) |
| CRIT % |
23 % (3 %) |
| CRIT DMG |
162 % (12 %) |
| ACC |
30 % (10 %) |
| RES |
50 % (30 %) |
|
EHP
|
24867 |
| DEF |
+14 % |
| DEF |
+6 % |
| ATK |
+59 |
| CRIT |
+5 % |
| ACC |
+3 % |
Glyph efficiency
Basic
38
Support
31
Debuf.
19
| DEF |
+11 % |
| HP |
+61 |
| HP |
+2 % |
| CRIT |
+3 % |
| RES |
+1 % |
Glyph efficiency
Basic
14
Support
24
Debuf.
6
| HP |
+1458 |
| ATK |
+4 % |
| ACC |
+4 % |
| RES |
+3 % |
| SPD |
+6 |
Glyph efficiency
Basic
41
Support
43
Debuf.
26
| HP |
+947 |
| HP |
+43 |
| DEF |
+2 % |
| ATK |
+25 |
| CRIT |
+4 % |
| SPD |
+2 |
Glyph efficiency
Basic
22
Support
11
Debuf.
10
| HP |
+1458 |
| DEF |
+4 % |
| % CRIT |
+3 % |
| ACC |
+3 % |
| RES |
+4 % |
| SPD |
+4 |
Glyph efficiency
Basic
43
Support
47
Debuf.
40
| HP |
+16 % |
| DEF |
+2 % |
| RES |
+2 % |
Glyph efficiency
Basic
9
Support
9
Debuf.
4
Evania
LVL 30
| HP |
16099 (9749) |
| ATK |
1283 (335) |
| DEF |
1039 (538) |
| SPD |
117 (37) |
| CRIT % |
27 % (7 %) |
| CRIT DMG |
177 % (27 %) |
| ACC |
41 % (21 %) |
| RES |
23 % (3 %) |
|
EHP
|
64804 |
| SPD |
+24 |
| HP |
+9 % |
| DEF |
+5 % |
| ATK |
+29 |
| % CRIT |
+7 % |
| ACC |
+4 % |
Glyph efficiency
Basic
61
Support
48
Debuf.
36
| DEF |
+174 |
| ATK |
+42 |
| ATK |
+7 % |
| CRIT |
+7 % |
| ACC |
+7 % |
| SPD |
+4 |
Glyph efficiency
Basic
60
Support
34
Debuf.
29
| HP |
+2059 |
| DEF |
+15 |
| ATK |
+4 % |
| CRIT |
+7 % |
| ACC |
+3 % |
| SPD |
+6 |
Glyph efficiency
Basic
46
Support
39
Debuf.
28
| DEF |
+174 |
| DEF |
+22 |
| ATK |
+49 |
| CRIT |
+6 % |
| ACC |
+4 % |
Glyph efficiency
Basic
36
Support
27
Debuf.
18
| HP |
+2760 |
| HP |
+209 |
| HP |
+5 % |
| DEF |
+28 |
| ATK |
+46 |
| CRIT |
+7 % |
Glyph efficiency
Basic
48
Support
44
Debuf.
26
| HP |
+3577 |
| HP |
+4 % |
| ATK |
+65 |
| ACC |
+3 % |
| RES |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
44
Support
42
Debuf.
23