Tour de l'Éternité
: TOE: Nako/EDK/poison/polymorph team - créé par Azrael616 le 26/08/2020
Description :
Nako/EDK/poison/polymorph team.
Polymorph removes immunities.
EDK's aura allows to survive initial AOE hits.
Immunity on all and EDK's S3 allow to survive purging up to 3 buffs in the first round of attacks.
Good against revive blockers.
Weaknesses: Fire Harpies (infinite loop with Nako's passive), thornmail-resistant Fire Colossus, thornmail-resistant Water Juggernaut, AOE purgers.
Nako/EDK/poison/polymorph team.
Polymorph removes immunities.
EDK's aura allows to survive initial AOE hits.
Immunity on all and EDK's S3 allow to survive purging up to 3 buffs in the first round of attacks.
Good against revive blockers.
Weaknesses: Fire Harpies (infinite loop with Nako's passive), thornmail-resistant Fire Colossus, thornmail-resistant Water Juggernaut, AOE purgers.
Nakoruru d'eau
LVL 35
 HP |
17478 (10943) |
|---|---|
 ATK |
2074 (746) |
 DEF |
1660 (982) |
 SPD |
87 (8) |
 CRIT % |
39 % (9 %) |
 CRIT DMG |
177 % (27 %) |
 ACC |
18 % (3 %) |
 RES |
129 % (114 %) |
 EHP
|
120439 |
| DEF |
+49 % |
| DEF |
+8 % |
| ATK |
+72 |
| CRIT |
+14 % |
| RES |
+3 % |
| SPD |
+4 |
Glyph efficiency
Basic
68
Support
49
Debuf.
39
| DEF |
+49 % |
| HP |
+4 % |
| DEF |
+10 % |
| ATK |
+73 |
| ATK |
+10 % |
| % CRIT |
+3 % |
Glyph efficiency
Basic
70
Support
43
Debuf.
40
| HP |
+69 % |
| HP |
+5 % |
| DEF |
+59 |
| ATK |
+17 % |
| % CRIT |
+6 % |
| RES |
+17 % |
Glyph efficiency
Basic
121
Dps
14
Support
87
Debuf.
27
| HP |
+69 % |
| DEF |
+29 |
| DEF |
+4 % |
| ATK |
+96 |
| RES |
+20 % |
Glyph efficiency
Basic
87
Support
68
Debuf.
16
| RES |
+23 % |
| HP |
+9 % |
| CRIT |
+13 % |
| ACC |
+3 % |
| RES |
+10 % |
| SPD |
+4 |
Glyph efficiency
Basic
79
Support
72
| RES |
+25 % |
| HP |
+488 |
| HP |
+4 % |
| DEF |
+12 % |
| ATK |
+11 % |
| RES |
+16 % |
Glyph efficiency
Basic
115
Support
108
Dion
LVL 35
| HP |
14301 (8674) |
|---|---|
| ATK |
1699 (223) |
| DEF |
1303 (767) |
| SPD |
158 (83) |
| CRIT % |
60 % (35 %) |
| CRIT DMG |
188 % (38 %) |
| ACC |
124 % (59 %) |
| RES |
17 % (7 %) |
|
EHP
|
73606 |
| SPD |
+27 |
| HP |
+214 |
| DEF |
+83 |
| ATK |
+39 |
| CRIT |
+12 % |
| ACC |
+6 % |
Glyph efficiency
Basic
77
Support
60
Debuf.
65
| SPD |
+27 |
| % CRIT |
+10 % |
| CRIT |
+20 % |
| ACC |
+6 % |
Glyph efficiency
Basic
69
Dps
11
Support
23
Debuf.
32
| HP |
+3577 |
| DEF |
+25 |
| ATK |
+49 |
| % CRIT |
+4 % |
| ACC |
+14 % |
| SPD |
+7 |
Glyph efficiency
Basic
81
Support
43
Debuf.
63
| DEF |
+265 |
| HP |
+349 |
| DEF |
+51 |
| ATK |
+43 |
| ACC |
+12 % |
| SPD |
+4 |
Glyph efficiency
Basic
81
Support
57
Debuf.
72
| HP |
+3577 |
| ATK |
+3 % |
| CRIT |
+6 % |
| ACC |
+11 % |
| RES |
+7 % |
| SPD |
+8 |
Glyph efficiency
Basic
80
Support
51
Debuf.
50
| DEF |
+64 % |
| HP |
+17 % |
| ATK |
+48 |
| % CRIT |
+11 % |
| ACC |
+10 % |
| SPD |
+10 |
Glyph efficiency
Basic
121
Dps
7
Support
87
Debuf.
98
Ratmir
LVL 35
| HP |
13088 (6226) |
|---|---|
| ATK |
1321 (198) |
| DEF |
1376 (563) |
| SPD |
158 (79) |
| CRIT % |
45 % (30 %) |
| CRIT DMG |
194 % (44 %) |
| ACC |
109 % (94 %) |
| RES |
89 % (44 %) |
|
EHP
|
71751 |
| SPD |
+27 |
| HP |
+303 |
| ATK |
+41 |
| CRIT |
+13 % |
| ACC |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
58
Support
41
Debuf.
45
| SPD |
+30 |
| % CRIT |
+13 % |
| CRIT |
+8 % |
| ACC |
+14 % |
| RES |
+6 % |
| SPD |
+9 |
Glyph efficiency
Basic
116
Dps
17
Support
70
Debuf.
61
| DEF |
+339 |
| HP |
+4 % |
| DEF |
+59 |
| % CRIT |
+6 % |
| ACC |
+12 % |
| SPD |
+5 |
Glyph efficiency
Basic
85
Support
70
Debuf.
70
| HP |
+4003 |
| HP |
+499 |
| HP |
+10 % |
| DEF |
+7 % |
| ATK |
+46 |
| ACC |
+14 % |
Glyph efficiency
Basic
100
Support
88
Debuf.
104
| ACC |
+25 % |
| HP |
+255 |
| DEF |
+59 |
| ATK |
+111 |
| RES |
+9 % |
| SPD |
+5 |
Glyph efficiency
Basic
88
Support
16
Debuf.
40
| ACC |
+25 % |
| HP |
+206 |
| DEF |
+6 % |
| % CRIT |
+11 % |
| CRIT |
+23 % |
| RES |
+4 % |
Glyph efficiency
Basic
91
Dps
19
Debuf.
34
Aharon
LVL 30
| HP |
8560 (2812) |
|---|---|
| ATK |
1747 (266) |
| DEF |
886 (320) |
| SPD |
173 (94) |
| CRIT % |
38 % (8 %) |
| CRIT DMG |
264 % (114 %) |
| ACC |
101 % (86 %) |
| RES |
19 % (4 %) |
|
EHP
|
29453 |
| SPD |
+27 |
| HP |
+499 |
| DEF |
+39 |
| ATK |
+4 % |
| ACC |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
60
Support
62
Debuf.
65
| SPD |
+27 |
| HP |
+416 |
| DEF |
+47 |
| DEF |
+5 % |
| RES |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
61
Support
76
Debuf.
62
| CRIT |
+51 % |
| HP |
+226 |
| DEF |
+10 % |
| % CRIT |
+8 % |
| ACC |
+9 % |
| SPD |
+8 |
Glyph efficiency
Basic
92
Dps
38
Support
11
Debuf.
22
| CRIT |
+51 % |
| DEF |
+7 % |
| ATK |
+4 % |
| CRIT |
+6 % |
| ACC |
+10 % |
| SPD |
+9 |
Glyph efficiency
Basic
78
Dps
33
Debuf.
13
| ACC |
+23 % |
| DEF |
+47 |
| ATK |
+10 % |
| CRIT |
+6 % |
| ACC |
+4 % |
| SPD |
+7 |
Glyph efficiency
Basic
72
Debuf.
58
| ACC |
+25 % |
| HP |
+751 |
| HP |
+16 % |
| DEF |
+34 |
| DEF |
+5 % |
| ACC |
+11 % |
Glyph efficiency
Basic
114
Support
50
Debuf.
123