Arène
: offense - créé par DeHush le 24/06/2019
Anan
LVL 35
 HP |
8606 (2275) |
|---|---|
 ATK |
5435 (3814) |
 DEF |
739 (96) |
 SPD |
133 (51) |
 CRIT % |
78 % (48 %) |
 CRIT DMG |
162 % (12 %) |
 ACC |
29 % (14 %) |
 RES |
33 % (18 %) |
|
EHP
|
25168 |
| ATK |
+37 % |
| HP |
+138 |
| DEF |
+3 % |
| ATK |
+48 |
| ATK |
+5 % |
| % CRIT |
+4 % |
Glyph efficiency
Basic
42
Dps
48
| SPD |
+27 |
| HP |
+511 |
| ATK |
+4 % |
| ACC |
+8 % |
| RES |
+7 % |
| SPD |
+7 |
Glyph efficiency
Basic
85
Support
67
Debuf.
60
| % CRIT |
+23 % |
| HP |
+5 % |
| DEF |
+8 % |
| ATK |
+9 % |
| % CRIT |
+4 % |
| SPD |
+9 |
Glyph efficiency
Basic
77
Dps
65
| ATK |
+630 |
| HP |
+8 % |
| ATK |
+7 % |
| CRIT |
+12 % |
| ACC |
+3 % |
| SPD |
+4 |
Glyph efficiency
Basic
65
Dps
56
| ATK |
+49 % |
| HP |
+360 |
| HP |
+7 % |
| ATK |
+76 |
| % CRIT |
+7 % |
| SPD |
+4 |
Glyph efficiency
Basic
73
Dps
54
| ATK |
+49 % |
| DEF |
+4 % |
| ATK |
+46 |
| ATK |
+6 % |
| ACC |
+3 % |
| RES |
+11 % |
Glyph efficiency
Basic
64
Dps
37
Haru
LVL 28
| HP |
7883 (2252) |
|---|---|
| ATK |
2225 (1108) |
| DEF |
532 (109) |
| SPD |
136 (48) |
| CRIT % |
32 % (7 %) |
| CRIT DMG |
184 % (34 %) |
| ACC |
101 % (76 %) |
| RES |
15 % (5 %) |
|
EHP
|
17914 |
| ATK |
+438 |
| DEF |
+25 |
| ATK |
+80 |
| ACC |
+7 % |
| SPD |
+4 |
Glyph efficiency
Basic
52
Dps
17
| SPD |
+24 |
| HP |
+4 % |
| DEF |
+39 |
| DEF |
+5 % |
| ATK |
+27 |
| CRIT |
+13 % |
Glyph efficiency
Basic
55
Support
31
Debuf.
43
| ATK |
+323 |
| ATK |
+35 |
| % CRIT |
+3 % |
| CRIT |
+12 % |
| ACC |
+5 % |
Glyph efficiency
Basic
44
Dps
32
| HP |
+36 % |
| ATK |
+126 |
| ATK |
+3 % |
| % CRIT |
+2 % |
| ACC |
+6 % |
Glyph efficiency
Basic
51
Support
8
Debuf.
32
| ACC |
+17 % |
| % CRIT |
+2 % |
| CRIT |
+4 % |
| ACC |
+2 % |
| RES |
+5 % |
| SPD |
+7 |
Glyph efficiency
Basic
46
Debuf.
38
| ACC |
+17 % |
| DEF |
+24 |
| ATK |
+4 % |
| CRIT |
+5 % |
| ACC |
+2 % |
| SPD |
+3 |
Glyph efficiency
Basic
36
Debuf.
35
Chikyu
LVL 30
| HP |
11025 (4062) |
|---|---|
| ATK |
1175 (210) |
| DEF |
496 (117) |
| SPD |
156 (80) |
| CRIT % |
55 % (35 %) |
| CRIT DMG |
164 % (14 %) |
| ACC |
39 % (19 %) |
| RES |
47 % (2 %) |
|
EHP
|
23902 |
| SPD |
+20 |
| HP |
+2 % |
| RES |
+2 % |
| SPD |
+5 |
Glyph efficiency
Basic
22
Support
37
Debuf.
31
| SPD |
+23 |
| HP |
+151 |
| HP |
+2 % |
| ATK |
+69 |
| ACC |
+4 % |
| SPD |
+5 |
Glyph efficiency
Basic
47
Support
28
Debuf.
33
| % CRIT |
+23 % |
| HP |
+121 |
| % CRIT |
+12 % |
| CRIT |
+14 % |
| ACC |
+3 % |
| SPD |
+8 |
Glyph efficiency
Basic
83
Dps
86
| HP |
+2760 |
| HP |
+543 |
| DEF |
+26 |
| ATK |
+4 % |
| ACC |
+7 % |
Glyph efficiency
Basic
58
Support
56
Debuf.
49
| HP |
+3 % |
| ATK |
+19 |
| ACC |
+3 % |
| SPD |
+2 |
Glyph efficiency
Basic
16
Support
24
Debuf.
28
| DEF |
+21 % |
| DEF |
+3 % |
| ATK |
+25 |
| ATK |
+6 % |
| ACC |
+2 % |
| SPD |
+7 |
Glyph efficiency
Basic
46
Support
41
Debuf.
43
Kaito
LVL 30
| HP |
14227 (8355) |
|---|---|
| ATK |
1166 (290) |
| DEF |
762 (233) |
| SPD |
195 (114) |
| CRIT % |
31 % (11 %) |
| CRIT DMG |
170 % (20 %) |
| ACC |
27 % (7 %) |
| RES |
24 % (4 %) |
|
EHP
|
42714 |
| SPD |
+27 |
| HP |
+3 % |
| ATK |
+71 |
| ATK |
+5 % |
| CRIT |
+7 % |
| SPD |
+13 |
Glyph efficiency
Basic
73
Dps
2
Support
39
Debuf.
38
| SPD |
+27 |
| HP |
+11 % |
| DEF |
+23 |
| ATK |
+81 |
| % CRIT |
+4 % |
| SPD |
+4 |
Glyph efficiency
Basic
66
Support
55
Debuf.
52
| HP |
+43 % |
| HP |
+252 |
| DEF |
+24 |
| ATK |
+4 % |
| ACC |
+3 % |
| SPD |
+8 |
Glyph efficiency
Basic
55
Support
58
Debuf.
45
| HP |
+31 % |
| DEF |
+9 % |
| ATK |
+33 |
| % CRIT |
+4 % |
| RES |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
52
Support
51
Debuf.
39
| HP |
+2760 |
| ATK |
+3 % |
| % CRIT |
+3 % |
| CRIT |
+13 % |
| SPD |
+11 |
Glyph efficiency
Basic
60
Dps
3
Support
43
Debuf.
43
| DEF |
+26 % |
| HP |
+3 % |
| ACC |
+4 % |
| SPD |
+11 |
Glyph efficiency
Basic
44
Support
54
Debuf.
44