Arène
: créé par Muk le 13/01/2020
Mamuro
LVL 35
 HP |
7252 (1101) |
|---|---|
 ATK |
4468 (2863) |
 DEF |
607 (60) |
 SPD |
105 (30) |
 CRIT % |
100 % (70 %) |
 CRIT DMG |
188 % (38 %) |
 ACC |
33 % (18 %) |
 RES |
27 % (12 %) |
|
EHP
|
18119 |
| SPD |
+23 |
| HP |
+94 |
| HP |
+2 % |
| ATK |
+7 % |
| ACC |
+3 % |
| SPD |
+7 |
Glyph efficiency
Basic
47
Support
29
Debuf.
33
| ATK |
+42 % |
| HP |
+3 % |
| DEF |
+4 % |
| ATK |
+64 |
| ATK |
+10 % |
| CRIT |
+18 % |
Glyph efficiency
Basic
73
Dps
76
| % CRIT |
+20 % |
| HP |
+266 |
| HP |
+2 % |
| DEF |
+11 |
| ATK |
+35 |
| % CRIT |
+2 % |
Glyph efficiency
Basic
31
Dps
26
| % CRIT |
+24 % |
| DEF |
+5 % |
| ATK |
+43 |
| % CRIT |
+11 % |
| CRIT |
+13 % |
| ACC |
+4 % |
Glyph efficiency
Basic
75
Dps
75
| ATK |
+34 % |
| HP |
+2 % |
| ATK |
+29 |
| ATK |
+4 % |
| % CRIT |
+3 % |
| RES |
+12 % |
Glyph efficiency
Basic
55
Dps
39
| ATK |
+42 % |
| HP |
+187 |
| ATK |
+76 |
| ATK |
+4 % |
| CRIT |
+7 % |
| ACC |
+11 % |
Glyph efficiency
Basic
69
Dps
48
Actaeon
LVL 35
| HP |
20023 (13626) |
|---|---|
| ATK |
1797 (367) |
| DEF |
398 (56) |
| SPD |
136 (69) |
| CRIT % |
34 % (4 %) |
| CRIT DMG |
188 % (38 %) |
| ACC |
143 % (103 %) |
| RES |
27 % (12 %) |
|
EHP
|
37988 |
| SPD |
+28 |
| HP |
+8 % |
| ATK |
+88 |
| ATK |
+4 % |
| CRIT |
+12 % |
| ACC |
+8 % |
Glyph efficiency
Basic
79
Support
26
Debuf.
51
| SPD |
+27 |
| HP |
+8 % |
| ATK |
+4 % |
| % CRIT |
+4 % |
| CRIT |
+6 % |
| ACC |
+3 % |
Glyph efficiency
Basic
50
Support
20
Debuf.
38
| HP |
+61 % |
| HP |
+3 % |
| DEF |
+17 |
| ATK |
+3 % |
| ACC |
+14 % |
| RES |
+4 % |
Glyph efficiency
Basic
63
Support
39
Debuf.
64
| HP |
+59 % |
| DEF |
+25 |
| DEF |
+4 % |
| ATK |
+42 |
| CRIT |
+13 % |
| ACC |
+11 % |
Glyph efficiency
Basic
71
Support
30
Debuf.
60
| ACC |
+23 % |
| HP |
+192 |
| HP |
+8 % |
| ATK |
+49 |
| ACC |
+4 % |
| SPD |
+11 |
Glyph efficiency
Basic
72
Support
7
Debuf.
75
| HP |
+59 % |
| HP |
+4 % |
| ATK |
+31 |
| CRIT |
+7 % |
| RES |
+8 % |
| SPD |
+3 |
Glyph efficiency
Basic
52
Support
36
Debuf.
30
Bellona
LVL 35
| HP |
18439 (11266) |
|---|---|
| ATK |
1734 (407) |
| DEF |
942 (198) |
| SPD |
143 (72) |
| CRIT % |
59 % (29 %) |
| CRIT DMG |
163 % (13 %) |
| ACC |
140 % (100 %) |
| RES |
35 % (20 %) |
|
EHP
|
67287 |
| SPD |
+28 |
| DEF |
+17 |
| DEF |
+3 % |
| % CRIT |
+11 % |
| ACC |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
54
Support
23
Debuf.
41
| SPD |
+27 |
| HP |
+419 |
| DEF |
+7 % |
| ATK |
+4 % |
| ACC |
+3 % |
| SPD |
+7 |
Glyph efficiency
Basic
65
Support
54
Debuf.
70
| HP |
+69 % |
| HP |
+769 |
| DEF |
+33 |
| ATK |
+35 |
| ATK |
+17 % |
| RES |
+9 % |
Glyph efficiency
Basic
108
Support
67
Debuf.
55
| HP |
+61 % |
| HP |
+186 |
| DEF |
+3 % |
| RES |
+7 % |
| SPD |
+7 |
Glyph efficiency
Basic
49
Support
49
Debuf.
45
| ACC |
+24 % |
| HP |
+6 % |
| DEF |
+7 % |
| % CRIT |
+7 % |
| ACC |
+3 % |
| RES |
+4 % |
Glyph efficiency
Basic
61
Debuf.
47
| ACC |
+23 % |
| HP |
+137 |
| ATK |
+7 % |
| % CRIT |
+11 % |
| CRIT |
+13 % |
| ACC |
+4 % |
Glyph efficiency
Basic
76
Dps
10
Debuf.
31
Xanthus
LVL 35
| HP |
20074 (11881) |
|---|---|
| ATK |
1427 (357) |
| DEF |
779 (320) |
| SPD |
194 (111) |
| CRIT % |
54 % (34 %) |
| CRIT DMG |
183 % (33 %) |
| ACC |
20 % |
| RES |
43 % (23 %) |
|
EHP
|
61438 |
| SPD |
+23 |
| DEF |
+28 |
| DEF |
+5 % |
| CRIT |
+5 % |
| RES |
+6 % |
| SPD |
+5 |
Glyph efficiency
Basic
54
Support
62
Debuf.
45
| SPD |
+29 |
| HP |
+5 % |
| DEF |
+23 |
| ATK |
+39 |
| % CRIT |
+7 % |
| RES |
+7 % |
Glyph efficiency
Basic
61
Support
50
Debuf.
31
| % CRIT |
+23 % |
| HP |
+409 |
| DEF |
+21 |
| ATK |
+9 % |
| CRIT |
+7 % |
| SPD |
+7 |
Glyph efficiency
Basic
71
Dps
44
| HP |
+61 % |
| HP |
+329 |
| HP |
+8 % |
| ATK |
+4 % |
| CRIT |
+7 % |
| SPD |
+7 |
Glyph efficiency
Basic
66
Support
63
Debuf.
60
| HP |
+59 % |
| ATK |
+147 |
| % CRIT |
+4 % |
| RES |
+4 % |
| SPD |
+10 |
Glyph efficiency
Basic
74
Support
50
Debuf.
40
| DEF |
+49 % |
| HP |
+3 % |
| ATK |
+3 % |
| CRIT |
+14 % |
| RES |
+6 % |
| SPD |
+10 |
Glyph efficiency
Basic
72
Support
61
Debuf.
45