Arène
: att/def - créé par ToXiK72 le 09/02/2020
Rachel
LVL 35
 HP |
27341 (20011) |
|---|---|
 ATK |
1394 (158) |
 DEF |
798 (125) |
 SPD |
132 (59) |
 CRIT % |
37 % (17 %) |
 CRIT DMG |
156 % (6 %) |
 ACC |
27 % (7 %) |
 RES |
54 % (9 %) |
 EHP
|
85478 |
| SPD |
+23 |
| HP |
+86 |
| HP |
+7 % |
| DEF |
+2 % |
| % CRIT |
+3 % |
Glyph efficiency
Basic
29
Support
37
Debuf.
20
| SPD |
+27 |
| DEF |
+8 % |
| ATK |
+5 % |
| ACC |
+4 % |
| RES |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
54
Support
54
Debuf.
33
| HP |
+3577 |
| HP |
+448 |
| HP |
+3 % |
| ATK |
+40 |
| % CRIT |
+7 % |
| RES |
+3 % |
Glyph efficiency
Basic
59
Support
48
Debuf.
23
| HP |
+50 % |
| HP |
+140 |
| HP |
+10 % |
| ATK |
+25 |
| RES |
+2 % |
Glyph efficiency
Basic
36
Support
46
Debuf.
23
| HP |
+59 % |
| DEF |
+18 |
| DEF |
+6 % |
| SPD |
+6 |
Glyph efficiency
Basic
33
Support
48
Debuf.
31
| HP |
+59 % |
| HP |
+7 % |
| ATK |
+31 |
| % CRIT |
+7 % |
| CRIT |
+6 % |
| ACC |
+3 % |
Glyph efficiency
Basic
54
Support
33
Debuf.
21
Lilim
LVL 35
| HP |
11419 (5039) |
|---|---|
| ATK |
2521 (926) |
| DEF |
625 (182) |
| SPD |
156 (74) |
| CRIT % |
74 % (44 %) |
| CRIT DMG |
218 % (68 %) |
| ACC |
34 % (19 %) |
| RES |
39 % (24 %) |
|
EHP
|
29170 |
| SPD |
+20 |
| ATK |
+2 % |
| CRIT |
+4 % |
| ACC |
+3 % |
| RES |
+6 % |
Glyph efficiency
Basic
32
Support
34
Debuf.
23
| SPD |
+20 |
| HP |
+3 % |
| DEF |
+30 |
| ATK |
+2 % |
| ACC |
+2 % |
| SPD |
+3 |
Glyph efficiency
Basic
33
Support
41
Debuf.
42
| % CRIT |
+23 % |
| DEF |
+4 % |
| ATK |
+5 % |
| % CRIT |
+7 % |
| CRIT |
+6 % |
| SPD |
+11 |
Glyph efficiency
Basic
72
Dps
61
| CRIT |
+51 % |
| HP |
+10 % |
| DEF |
+44 |
| DEF |
+3 % |
| % CRIT |
+7 % |
| CRIT |
+7 % |
Glyph efficiency
Basic
68
Dps
33
| ATK |
+49 % |
| HP |
+4 % |
| DEF |
+6 % |
| % CRIT |
+7 % |
| ACC |
+4 % |
| RES |
+6 % |
Glyph efficiency
Basic
63
Dps
23
| HP |
+59 % |
| HP |
+3 % |
| DEF |
+28 |
| DEF |
+5 % |
| ACC |
+10 % |
| RES |
+12 % |
Glyph efficiency
Basic
80
Support
83
Debuf.
65
Malia
LVL 35
| HP |
12954 (6900) |
|---|---|
| ATK |
1614 (290) |
| DEF |
697 (137) |
| SPD |
157 (76) |
| CRIT % |
29 % (4 %) |
| CRIT DMG |
178 % (28 %) |
| ACC |
119 % (69 %) |
| RES |
20 % (10 %) |
|
EHP
|
36077 |
| SPD |
+23 |
| HP |
+2 % |
| DEF |
+53 |
| DEF |
+3 % |
| CRIT |
+4 % |
| ACC |
+8 % |
Glyph efficiency
Basic
53
Support
53
Debuf.
62
| SPD |
+23 |
| DEF |
+2 % |
| CRIT |
+4 % |
| ACC |
+5 % |
| RES |
+2 % |
| SPD |
+6 |
Glyph efficiency
Basic
42
Support
45
Debuf.
47
| HP |
+50 % |
| HP |
+231 |
| DEF |
+3 % |
| ATK |
+39 |
| % CRIT |
+3 % |
| ACC |
+5 % |
Glyph efficiency
Basic
44
Support
37
Debuf.
43
| HP |
+50 % |
| HP |
+3 % |
| ATK |
+40 |
| ATK |
+2 % |
| ACC |
+6 % |
| RES |
+4 % |
Glyph efficiency
Basic
43
Support
39
Debuf.
37
| ACC |
+18 % |
| HP |
+3 % |
| DEF |
+2 % |
| % CRIT |
+1 % |
| ACC |
+4 % |
| SPD |
+4 |
Glyph efficiency
Basic
34
Debuf.
46
| ACC |
+23 % |
| HP |
+130 |
| DEF |
+28 |
| ATK |
+14 % |
| CRIT |
+20 % |
| RES |
+4 % |
Glyph efficiency
Basic
82
Dps
15
Debuf.
29
Xanthus
LVL 35
| HP |
17986 (10143) |
|---|---|
| ATK |
1124 (54) |
| DEF |
1049 (590) |
| SPD |
179 (96) |
| CRIT % |
35 % (15 %) |
| CRIT DMG |
198 % (48 %) |
| ACC |
40 % (20 %) |
| RES |
39 % (19 %) |
|
EHP
|
73117 |
| SPD |
+27 |
| % CRIT |
+7 % |
| CRIT |
+7 % |
| ACC |
+7 % |
| RES |
+7 % |
| SPD |
+9 |
Glyph efficiency
Basic
85
Support
64
Debuf.
57
| SPD |
+27 |
| HP |
+4 % |
| DEF |
+52 |
| DEF |
+4 % |
| ACC |
+4 % |
| RES |
+10 % |
Glyph efficiency
Basic
68
Support
78
Debuf.
56
| HP |
+50 % |
| DEF |
+10 |
| DEF |
+7 % |
| CRIT |
+9 % |
| RES |
+2 % |
| SPD |
+3 |
Glyph efficiency
Basic
43
Support
45
Debuf.
38
| HP |
+50 % |
| HP |
+2 % |
| DEF |
+6 % |
| ATK |
+5 % |
| ACC |
+2 % |
| SPD |
+2 |
Glyph efficiency
Basic
36
Support
39
Debuf.
40
| DEF |
+49 % |
| HP |
+205 |
| HP |
+10 % |
| % CRIT |
+4 % |
| CRIT |
+13 % |
| ACC |
+7 % |
Glyph efficiency
Basic
75
Support
53
Debuf.
60
| DEF |
+49 % |
| HP |
+133 |
| HP |
+9 % |
| % CRIT |
+4 % |
| CRIT |
+19 % |
| SPD |
+8 |
Glyph efficiency
Basic
81
Dps
2
Support
59
Debuf.
56